Molecular χ(2) gratings via electron-beam lithography

Optical waveguides with apodized sidewall gratings via spatial-phase- locked electron-beam lithography

We describe a technique to fabricate Bragg gratings in the sides of optical waveguides using a single lithographic step. This technique is particularly suited to the apodized gratings required for add/drop filters in dense-wavelength-division multiplexing. Apodization minimizes cross talk between channels and improves the filter response. Silicon-on-insulator rib waveguides with both uniform an...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

Computer Simulation from Electron Beam Lithography to Optical Lithography

Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal mask design, the combined simulation has shown that mask distortion due to electron proximity effect play an important role in worsening the optical ...

Electron Beam Lithography for Applications in Nanotechnology

Nanotechnology, apart from being a catch phrase for media and funding, has a serious role for the development of future products in the field of information technology. Specifically, future generations of memory and logic chips depend strongly on the ability of nanolithography. In addition to the promising field of nanoelectronics, optoelectronics as well as photonic devices benefit from the po...